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High Resolution X-ray Diffractometry And Topograph

High Resolution X-ray Diffractometry And Topograph
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US$ 99.95 (+ tax)
The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.
Taylor & Francis; February 1998
264 pages; ISBN 9780203979198
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ISBNs
9781135478612
9781135478605
9780850667585
9780203979198
0203979192