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High Density Plasma Sources
Design, Physics and Performance
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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications.
This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Elsevier Science; December 1996
467 pages; ISBN 9780815517894
Read online, or download in secure PDF format
467 pages; ISBN 9780815517894
Read online, or download in secure PDF format
Subject categories
- Academic > Physics > Plasma physics. Ionized gases > Plasma (Ionized gases)
- Academic > Physics > Plasma physics. Ionized gases > Plasma density
- Academic > Physics > General > Physics
- Academic > Physics > Electricity
- Academic > Physics > Electricity and magnetism
- Academic > Physics > Physics; History
- Technology > Engineering > Mechanical
- Science > Physics
- Technology > Electronics
- Technology > Metallurgy
- Technology > Material Science
ISBNs
0815517890
9780815513773
9780815517894