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SIMOX

SIMOX
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US$ 110.00
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Separation-by-Implanted-Oxygen (SIMOX) technology is a method of fabrication of silicon on-insulator structures and substrates by implanting high doses of oxygen and high temperature annealing. SIMOX consists of a sequence of chapters, each of which is written by a pioneer or key contributor to the technical area. The content includes an historical perspective of SIMOX developments, fundamental formation mechanisms, emerging techniques, along with SOI material characterisation methods and results, technological processes from R&D to advanced applications, and a brief overview of VLSI circuit applications. 
The Institution of Engineering and Technology; January 1753
161 pages; ISBN 9781849190640
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