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  • Plasma Diagnosticsby Orlando Auciello; Daniel L. Flamm

    Elsevier Science 2013; US$ 72.95

    Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well... more...

  • Plasma Diagnosticsby Orlando Auciello; Daniel L. Flamm

    Elsevier Science 2013; US$ 72.95

    Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas... more...

  • Plasma Etchingby Dennis M. Manos; Daniel L. Flamm

    Elsevier Science 1989; US$ 72.95

    Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry,... more...

  • Plasma Deposition, Treatment, and Etching of Polymersby Riccardo d'Agostino; Daniel L. Flamm; Orlando Auciello

    Elsevier Science 2012; US$ 93.95

    Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers... more...

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