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Maurice H. Francombe

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  • Advances in Research and Developmentby Maurice H. Francombe; John L. Vossen

    Elsevier Science 1995; US$ 72.95

    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of twenty volumes since 1963. The series contains quality studies of the properties of various thinfilms materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the... more...

  • Advances in Research and Developmentby Maurice H. Francombe; John L. Vossen

    Elsevier Science 1997; US$ 225.00

    Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate... more...

  • Author and Subject Cumulative Index, Including Tables of Contentsby Ronald Powell; Maurice H. Francombe; Abraham Ulman

    Elsevier Science 1998; US$ 230.00

    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series,... more...

  • Physics of Thin Filmsby Maurice H. Francombe; John L. Vossen

    Elsevier Science 2013; US$ 72.95

    Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter... more...

  • Thin Films for Emerging Applicationsby Maurice H. Francombe; John L. Vossen

    Elsevier Science 2016; US$ 72.95

    Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate... more...

  • Thin Films for Advanced Electronic Devicesby Maurice H. Francombe; John L. Vossen

    Elsevier Science 2016; US$ 72.95

    In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition... more...

  • Mechanic and Dielectric Propertiesby Maurice H. Francombe; John L. Vossen

    Elsevier Science 2016; US$ 72.95

    Mechanic and Dielectric Properties deals with the mechanical and dielectric properties of thin films. Topics covered range from the deposition and mechanical properties of superlattice thin films to the preparation of hard coatings by sputtering and arc evaporation. The use of thin films in microwave acoustics is also discussed, along with ferroelectric... more...

  • Physics of Thin Filmsby Maurice H. Francombe; Richard W. Hoffman

    Elsevier Science 2013; US$ 72.95

    Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five... more...

  • Plasma Sources for Thin Film Deposition and Etchingby Maurice H. Francombe; John L. Vossen

    Elsevier Science 2013; US$ 72.95

    This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma. Chapter One develops a unified framework from which all "high-efficiency"... more...

  • Frontiers of Thin Film Technologyby Stephen M. Rossnagel; Abraham Ulman; Maurice H. Francombe

    Elsevier Science 2000; US$ 235.00

    Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students... more...