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  • Thin Film Processesby John L. Vossen

    Elsevier Science 1978; US$ 72.95

    Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines... more...

  • Thin Film Processes IIby Werner Kern; John L. Vossen

    Elsevier Science 1991; US$ 72.95

    This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when... more...

  • Advances in Research and Developmentby Maurice H. Francombe; John L. Vossen

    Elsevier Science 1995; US$ 72.95

    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of twenty volumes since 1963. The series contains quality studies of the properties of various thinfilms materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the... more...

  • Advances in Research and Developmentby Maurice H. Francombe; John L. Vossen

    Elsevier Science 1997; US$ 225.00

    Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate... more...

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