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Design for Manufacturability with Advanced Lithography

Design for Manufacturability with Advanced Lithography by Bei Yu
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This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Springer International Publishing; October 2015
173 pages; ISBN 9783319203850
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Title: Design for Manufacturability with Advanced Lithography
Author: Bei Yu; David Z. Pan
 
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