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High-k Gate Dielectrics for CMOS Technology

by Gang He(ed.) ; Zhaoqi Sun(ed.)
High-k Gate Dielectrics for CMOS Technology by Gang He
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A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological
viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these
materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies.

Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections
with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Wiley; June 2012
590 pages; ISBN 9783527646364
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Title: High-k Gate Dielectrics for CMOS Technology
Author: Gang He; Zhaoqi Sun
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